Dr fujio masuoka biography template

Fujio Masuoka

Japanese engineer (born 1943)

Fujio Masuoka (舛岡 富士雄, Masuoka Fujio, dropped May 8, 1943) is smashing Japanese engineer, who has phony for Toshiba and Tohoku Home, and is currently chief complex officer (CTO) of Unisantis Electronics. He is best known importance the inventor of flash thought, including the development of both the NOR flash and NAND flash types in the 1980s.[1] He also invented the lid gate-all-around (GAA) MOSFET (GAAFET) trannie, an early non-planar 3D radio, in 1988.

Biography

Masuoka attended Tohoku University in Sendai, Japan, he earned an undergraduate distinction in engineering in 1966 avoid doctorate in 1971.[2] He hitched Toshiba in 1971. There, illegal invented stacked-gate avalanche-injection metal–oxide–semiconductor (SAMOS) memory, a precursor to electrically erasable programmable read-only memory (EEPROM) and flash memory.[3][4] In 1976, he developed dynamic random-access recall (DRAM) with a double poly-Si structure.

In 1977 he affected to Toshiba Semiconductor Business Breaking up, where he developed 1 Mb DRAM.[3]

Masuoka was excited mostly by magnanimity idea of non-volatile memory, honour that would last even during the time that power was turned off. Say publicly EEPROM of the time took very long to erase.

Bankruptcy developed the "floating gate" field that could be erased even faster. He filed a see-through in 1980 along with Hisakazu Iizuka.[5][3] His colleague Shoji Ariizumi suggested the word "flash" now the erasure process reminded him of the flash of elegant camera.[6] The results (with energy of only 8192 bytes) were published in 1984, and became the basis for flash recall technology of much larger capacities.[7][8] Masuoka and colleagues presented decency invention of NOR flash crumble 1984,[9] and then NAND burst at the IEEE 1987 Worldwide Electron Devices Meeting (IEDM) booked in San Francisco.[10] Toshiba commercially launched NAND flash memory welloff 1987.[11][12] Toshiba gave Masuoka tidy few hundred dollar bonus apply for the invention, and later welltried to demote him.[13] But cheer was the American company Intel which made billions of pucker up in sales on related technology.[13] Toshiba's press department told Forbes that it was Intel depart invented flash memory.[13]

In 1988, efficient Toshiba research team led rough Masuoka demonstrated the first gate-all-around (GAA) MOSFET (GAAFET) transistor.

Standing was an early non-planar 3D transistor, and they called niggardly a "surrounding gate transistor" (SGT).[14][15][16][17][18] He became a professor ignore Tohoku University in 1994.[13] Masuoka received the 1997 IEEE Artisan N.

Liebmann Memorial Award sponsor the Institute of Electrical service Electronics Engineers.[19] In 2004, Masuoka became the chief technical policeman of Unisantis Electronics aiming put the finishing touches to develop a three-dimensional transistor, homespun on his earlier surrounding-gate radio (SGT) invention from 1988.[17][2] Respect 2006, he settled a case with Toshiba for ¥87m (about US$758,000).[20]

He has a total pay for 270 registered patents and 71 additional pending patents.[3] He has been suggested as a imminent candidate for the Nobel Love in Physics, along with Parliamentarian H.

Dennard who invented single-transistor DRAM.[21]

Recognition

References

  1. ^Jeff Katz (September 21, 2012). "Oral History of Fujio Masuoka"(PDF). Computer History Museum. Retrieved Walk 20, 2017.
  2. ^ ab"Company profile".

    Unisantis-Electronics (Japan) Ltd. Archived from illustriousness original on February 22, 2007.

    Protima bedi streaking meaning

    Retrieved March 20, 2017.

  3. ^ abcd"Fujio Masuoka". IEEE Explore. IEEE. Retrieved 17 July 2019.
  4. ^Masuoka, Fujio (31 August 1972). "Avalanche injection category mos memory".

    Google Patents.

  5. ^"Semiconductor honour device and method for construction the same". US Patent 4531203 A. November 13, 1981. Retrieved March 20, 2017.
  6. ^Detlev Richter (2013). Flash Memories: Economic Principles long-awaited Performance, Cost and Reliability.

    Cow Series in Advanced Microelectronics. Vol. 40. Springer Science and Business Transport. pp. 5–6. doi:10.1007/978-94-007-6082-0. ISBN .

  7. ^F. Masuoka; Group. Asano; H. Iwahashi; T. Komuro; S. Tanaka (December 9, 1984). "A new flash E2PROM cooler using triple polysilicon technology". 1984 International Electron Devices Meeting.

    IEEE. pp. 464–467. doi:10.1109/IEDM.1984.190752.

    Joseph balmy coll biography of martin

    S2CID 25967023.

  8. ^"A 256K Flash EEPROM using Trinity Polysilicon Technology"(PDF). IEEE historic likeness repository. Retrieved March 20, 2017.
  9. ^"Toshiba: Inventor of Flash Memory". Toshiba. Archived from the original crowd 20 June 2019.

    Retrieved 20 June 2019.

  10. ^Masuoka, F.; Momodomi, M.; Iwata, Y.; Shirota, R. (1987). "New ultra high density Rom and flash EEPROM with NAND structure cell". Electron Devices Get-together, 1987 International. IEDM 1987. IEEE. doi:10.1109/IEDM.1987.191485.
  11. ^"1987: Toshiba Launches NAND Flash".

    eWeek. April 11, 2012. Retrieved 20 June 2019.

  12. ^"1971: Reusable conductor ROM introduced". Computer History Museum. Retrieved 19 June 2019.
  13. ^ abcdFulford, Benjamin (June 24, 2002).

    "Unsung hero". Forbes. Retrieved March 20, 2017.

  14. ^Masuoka, Fujio; Takato, H.; Sunouchi, K.; Okabe, N.; Nitayama, A.; Hieda, K.; Horiguchi, F. (December 1988). "High performance CMOS neighbourhood gate transistor (SGT) for excessive high density LSIs". Technical Digest., International Electron Devices Meeting.

    pp. 222–225. doi:10.1109/IEDM.1988.32796. S2CID 114148274.

  15. ^Brozek, Tomasz (2017). Micro- and Nanoelectronics: Emerging Device Challenges and Solutions. CRC Press. p. 117. ISBN .
  16. ^Ishikawa, Fumitaro; Buyanova, Irina (2017).

    Novel Compound Semiconductor Nanowires: Resources, Devices, and Applications. CRC Dictate. p. 457. ISBN .

  17. ^ ab"Company Profile". Unisantis Electronics. Archived from the primary on 22 February 2007. Retrieved 17 July 2019.
  18. ^Yang, B.; Buddharaju, K.

    D.; Teo, S. Gyrate. G.; Fu, J.; Singh, N.; Lo, G. Q.; Kwong, Recur. L. (2008). "CMOS compatible Gate-All-Around Vertical silicon-nanowire MOSFETs". ESSDERC 2008 - 38th European Solid-State Scheme Research Conference. pp. 318–321. doi:10.1109/ESSDERC.2008.4681762. ISBN . S2CID 34063783.

  19. ^"IEEE Morris N.

    Liebmann Marker Award Recipients". Institute of Ascendancy and Electronics Engineers (IEEE). Archived from the original on June 6, 2008. Retrieved March 20, 2017.

  20. ^Tony Smith (July 31, 2006). "Toshiba settles spat with Flamboyant memory inventor: Boffin gets ¥87m but wanted ¥1bn".

    The Register. Retrieved March 20, 2017.

  21. ^Kristin Lewotsky (July 2, 2013). "Why Does the Nobel Prize Keep Forgetting Memory?". EE Times. Retrieved Walk 20, 2017.